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Modeling of microsphere photolithography.

Chuang Qu, Chen Zhu, Edward C Kinzel

|December 31, 2020

Summary

Microsphere photolithography (MPL) uses photonic jets to create nanoscale features. A new model predicts MPL performance, guiding the fabrication of advanced metasurfaces for sensing and energy applications.

Area of Science:

Nanofabrication
Photolithography
Metasurfaces

Background:

Microsphere photolithography (MPL) leverages self-assembled microsphere arrays and photonic jets for nanoscale patterning.
Existing MPL techniques require precise control over fabrication parameters for optimal results.

Purpose of the Study:

To develop and validate a predictive model for photoresist exposure in MPL.
To provide insights into MPL process parameters influencing resolution, sensitivity, and feature geometry.

Main Methods:

Combining a full-wave electromagnetic model of microsphere/photoresist interaction with a photoresist development model.
Experimental validation of the developed model.
Simulation of sub-100 nm feature fabrication and split-ring resonator geometries.

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Main Results:

The model accurately predicts dose curves for MPL based on photoresist thickness, illumination, and development time.
Demonstrated fabrication of sub-100 nm hole/disk arrays.
Validated the use of superposition for predicting complex geometries like split-ring resonators.

Conclusions:

The developed model offers a predictive tool for optimizing MPL fabrication parameters.
This facilitates the scalable synthesis of large-area metasurfaces for sensing and energy management.
The model enhances understanding of photonic jet interactions for advanced nanofabrication.