Fabrication of three-dimensional high-aspect-ratio structures by oblique-incidence Talbot lithography

Developing a suitable production method for three-dimensional periodic nanostructures with high aspect ratios is a subject of growing interest. For mass production, Talbot lithography offers many advantages. However, one disadvantage is that the minimum period of the light intensity distribution is limited by the period of the diffraction grating used. To enhance the aspect ratio of fabricated nanostructures, in the present study we focus on multiple wave interference between diffracted waves created using the Talbot effect. We propose a unique exposure method to generate multiple wave interference between adjacent diffraction orders by controlling the angle of incidence of an ultraviolet (UV) light source. Using finite-difference time-domain simulations, we obtain fringe patterns with a sub-wavelength period using a one-dimensional periodic grating mask. Moreover, we demonstrate the practical application of this approach by using UV lithography to fabricate sub-wavelength periodic photopolymer-based structures with an aspect ratio of 30 in millimeter-scale areas, indicating its suitability for mass production.