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Updated: Nov 22, 2025

Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
Published on: October 23, 2018
Hysteresis-free MoS2metal semiconductor field-effect transistors with van der Waals Schottky junction
Da Wan1, Qixia Wang1, Hao Huang2
1School of Information Science and Engineering, Wuhan University of Science and Technology, Wuhan, 430081, People's Republic of China.
Abstract:
Hysteresis-free and steep subthreshold swing (SS) are essential for low-power reliable electronics. Herein, MoS2metal semiconductor field-effect transistors are fabricated with GeSe/MoS2van der Waals Schottky junction as a local gate, in which the rectification behavior of the heterojunction offers the modulation of channel carriers. The trap-free gate interface enables the hysteresis-free characteristics of the transistors, and promises an ideal SS of 64 mV/dec at room temperature. All the devices operate with a low threshold voltage less than -1 V with desirable saturation behavior. An OR logic gate is constructed with the dual-gated MoS2transistors by varying the back and top gate voltage. The strategy present here is promising for the design of low-power digital electronics based on 2D materials.
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