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Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors
Kenneth A Goldberg1, Antoine Wojdyla1, Diane Bryant1
1Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA.
Sensors (Basel, Switzerland)
|January 16, 2021
Summary
New reflective gratings enhance X-ray wavefront sensing for synchrotrons and free-electron lasers. These gratings offer improved power handling and broad energy bandwidth, crucial for adaptive optics and precise beamline alignment.
Area of Science:
- X-ray optics and instrumentation
- Wavefront sensing technologies
- Advanced materials for high-energy physics
Background:
- High-coherent-flux X-ray sources require precise wavefront sensing for optimal alignment.
- Adaptive X-ray optics necessitate real-time feedback mechanisms.
- Existing wavefront sensing technologies face limitations in power handling and energy bandwidth.
Purpose of the Study:
- To design and model a novel class of binary-amplitude reflective gratings for X-ray wavefront sensing.
- To evaluate the performance of these gratings for shearing interferometry and Hartmann sensing.
- To enable robust wavefront measurement for dynamic operating conditions in X-ray beamlines.
Main Methods:
- Design and simulation of deeply etched, binary-amplitude reflective gratings for glancing incidence.
- Application of coherent wave-propagation modeling to determine energy bandwidth.
- Modeling of shearing and Hartmann wavefront sensing tests with varying aberrations.
Main Results:
- Reflective gratings demonstrate superior power density handling compared to transmission membranes.
- Shearing interferometry exhibits a ±10% energy bandwidth, while Hartmann sensing achieves ±30% or more.
- Successful application to a soft X-ray beamline (230 eV–1400 eV) with modeled aberration correction.
Conclusions:
- The developed reflective gratings are suitable for advanced X-ray wavefront sensing applications.
- The proposed gratings offer significant advantages in power handling and energy bandwidth for dynamic beamline control.
- This technology supports the development of next-generation, high-performance X-ray light sources.
