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Updated: Nov 20, 2025

Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds
Published on: December 2, 2013
Rich p-type-doping phenomena in boron-substituted silicene systems
Hai Duong Pham1, Wu-Pei Su2, Thi Dieu Hien Nguyen3
1Center of General Studies, National Kaohsiung University of Science and Technology, Kaohsiung, Taiwan.
Boron substitution in silicene creates unique electronic properties by altering band structures and chemical environments. These changes, driven by charge transfer, offer new possibilities for advanced material applications.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Computational Chemistry
Background:
- Monolayer silicene exhibits unique electronic properties due to its 2D structure.
- Doping silicene is a key strategy to tune its electronic characteristics.
Purpose of the Study:
- To investigate the effects of boron substitution on the electronic properties of monolayer silicene.
- To analyze the resulting changes in band structure, charge distribution, and bonding.
Main Methods:
- First-principles calculations were employed to model boron-substituted silicene.
- Analysis included Moire superlattices, band structures, charge densities, and van Hove singularities.
Main Results:
- Hybridized 2p-3p and [2s, 2p]-[3s, 3p] bondings were identified.
- Boron substitution led to a red-shifted Fermi level and modified Dirac, pi, and sigma bands.
- Charge transfer resulted in a non-uniform chemical environment.
Conclusions:
- Boron substitution significantly enriches the essential properties of monolayer silicene.
- The diverse electronic properties arise from the non-uniform chemical environment induced by charge transfer.
- This study provides a theoretical framework for understanding and designing novel electronic materials.
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