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Updated: Nov 19, 2025

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization
Published on: July 12, 2016
Systematic electrochemical etching of various metal tips for tunneling spectroscopy and scanning probe microscopy
Jiawei Zhang1, Pinyuan Wang1, Xuao Zhang1
1International Center for Quantum Materials, School of Physics, Peking University, Beijing 100871, China.
Abstract:
Hard point-contact spectroscopy and scanning probe microscopy/spectroscopy are powerful techniques for investigating materials with strong expandability. To support these studies, tips with various physical and chemical properties are required. To ensure the reproducibility of experimental results, the fabrication of tips should be standardized, and a controllable and convenient system should be set up. Here, a systematic methodology to fabricate various tips is proposed, involving electrochemical etching reactions. The reaction parameters fall into four categories: solution, power supply, immersion depth, and interruption. An etching system was designed and built so that these parameters could be accurately controlled. With this system, etching parameters for copper, silver, gold, platinum/iridium alloy, tungsten, lead, niobium, iron, nickel, cobalt, and permalloy were explored and standardized. Among these tips, silver and niobium's new recipes were explored and standardized. Optical and scanning electron microscopies were performed to characterize the sharp needles. Relevant point-contact experiments were carried out with an etched silver tip to confirm the suitability of the fabricated tips.
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