EUV and Hard X-ray Hartmann Wavefront Sensing for Optical Metrology, Alignment and Phase Imaging

Area of Science:

• Optics and Photonics
• X-ray Science and Technology
• Metrology and Instrumentation

Background:

• Imagine Optic has over 15 years of experience in developing Extreme Ultra Violet (EUV) and X-ray Hartmann wavefront sensors.
• These sensors are crucial for metrology and imaging applications requiring precise wavefront characterization.
• Compatibility with a wide array of X-ray sources, including synchrotrons, Free Electron Lasers, and laser-driven sources, is a key feature.

Purpose of the Study:

• To detail the operational principles of Hartmann wavefront sensors.
• To outline key design parameters for achieving high-performance sensors.
• To present diverse applications of these sensors in scientific and industrial fields.

Main Methods:

• Description of the fundamental principles behind Hartmann wavefront sensing.
• Identification and explanation of critical design parameters for sensor optimization.
• Demonstration of sensor implementation in various experimental setups.

Main Results:

• Successful development and application of EUV and X-ray Hartmann wavefront sensors.
• Demonstrated compatibility with multiple advanced X-ray sources.
• Validation of sensor utility in metrology, source optimization, and imaging.

Conclusions:

• Hartmann wavefront sensors are effective tools for metrology and imaging across various X-ray applications.
• The design principles discussed enable the creation of high-performance wavefront sensing systems.
• These sensors offer significant advantages for optical alignment, soft X-ray source optimization, and X-ray imaging.