Structural, Optical and Electrical Properties of Al+MoO₃ and Au+MoO₃ Thin Films Prepared by Magnetron Codeposition

Structural, optical and electrical properties of Al+MoO₃ and Au+MoO₃ thin films prepared by simultaneous magnetron sputtering deposition were investigated. The influence of MoO₃ sputtering power on the Al and Au nanoparticle formation and spatial distribution was explored. We demonstrated the formation of spatially arranged Au nanoparticles in the MoO₃ matrix, while Al incorporates in the MoO₃ matrix without nanoparticle formation. The dependence of the Au nanoparticle size and arrangement on the MoO₃ sputtering power was established. The Al-based films show a decrease of overall absorption with an Al content increase, while the Au-based films have the opposite trend. The transport properties of the investigated films also are completely different. The resistivity of the Al-based films increases with the Al content, while it decreases with the Au content increase. The reason is a different transport mechanism that occurs in the films due to their different structural properties. The choice of the incorporated material (Al or Au) and its volume percentage in the MoO₃ matrix enables the design of materials with desirable optical and electrical characteristics for a variety of applications.