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Transient Prediction of Nanoparticle-Laden Droplet Drying Patterns through Dynamic Mode Decomposition
Melike Begum Tanis-Kanbur1, Volkan Kumtepeli2, Baris Burak Kanbur1
1School of Mechanical and Aerospace Engineering, Nanyang Technological University, Singapore 639798.
Langmuir : the ACS Journal of Surfaces and Colloids
|February 12, 2021
Summary
This study introduces a data-driven machine learning model to predict nanoparticle droplet drying patterns. The algorithm accurately forecasts drying behavior, droplet size, and coffee-ring formation using only top-view camera data.
Area of Science:
- Materials Science
- Fluid Dynamics
- Machine Learning
Background:
- Nanoparticle-laden sessile droplet drying is crucial for various applications.
- Predicting droplet evaporation dynamics and particle self-assembly remains challenging.
- Accurate prediction of drying patterns is essential for controlling material deposition.
Purpose of the Study:
- To develop a data-driven machine learning algorithm for predicting transient drying patterns of aluminum oxide (Al2O3) nanoparticle-laden sessile droplets.
- To utilize a single top-view camera data point for prediction.
- To assess the algorithm's accuracy in predicting drying patterns, droplet diameter, and coffee-ring thickness.
Main Methods:
- A data-driven machine learning algorithm was developed.
- Dynamic Mode Decomposition (DMD) was employed as the learning model.
- Transfer learning was applied to individual nanoparticle-laden droplet systems.
Main Results:
- The algorithm predicted transient drying patterns with less than 10% error.
- Predictions for droplet diameter showed less than 0.13% error.
- The model accurately predicted coffee-ring thickness (2.0-6.7 μm) and recognized liquid volume and drying regime transitions.
Conclusions:
- The developed data-driven approach accurately predicts nanoparticle-laden sessile droplet drying patterns.
- Machine learning, specifically DMD with transfer learning, offers a powerful tool for analyzing complex droplet dynamics.
- This method enables precise control over material deposition in applications involving nanoparticle drying.

