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Related Concept Videos

Colloidal precipitates01:09

Colloidal precipitates

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The high insolubility of some precipitates can result in an unfavorable relative supersaturation. This can lead to colloidal particles with a large surface-to-mass ratio, where adsorption is promoted. For instance, in the precipitation of silver chloride, silver ions are adsorbed on the surface of the colloidal particles, forming a primary layer. This layer attracts ions of opposite charge (such as nitrate ions), forming a diffuse secondary layer of adsorbed ions. This electric double layer...
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Related Experiment Video

Updated: Nov 15, 2025

Formation of Thick Dense Yttrium Iron Garnet Films Using Aerosol Deposition
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Toolbox for atomic layer deposition process development on high surface area powders.

K Knemeyer1, R Baumgarten1, P Ingale1

  • 1BasCat-UniCat BASF JointLab, Technische Universität Berlin, Hardenbergstraße 36, 10623 Berlin, Germany.

The Review of Scientific Instruments
|March 2, 2021
PubMed
Summary
This summary is machine-generated.

New setups accelerate Atomic Layer Deposition (ALD) for powders. These tools enable precise precursor selection and efficient temperature screening, reducing development time for novel ALD powder processes.

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Area of Science:

  • Materials Science
  • Chemical Engineering
  • Nanotechnology

Background:

  • Atomic Layer Deposition (ALD) is crucial for thin film applications.
  • Current ALD methods primarily focus on flat substrates, limiting powder applications.
  • Developing ALD processes for powders requires tailored reaction conditions and efficient development strategies.

Purpose of the Study:

  • To introduce two novel setups designed to enhance Atomic Layer Deposition (ALD) process development for powders.
  • To enable faster screening of precursors and reaction conditions for ALD on powder materials.
  • To reduce the overall time and resources required for establishing new ALD powder processes.

Main Methods:

  • A setup for direct vapor pressure measurement of ALD precursors using a capacitance diaphragm gauge.
  • A parallel reactor system with individual temperature zones for rapid screening of optimal ALD temperature windows.
  • Validation using trimethylaluminum (TMA) for aluminum oxide and diethyl zinc (DEZ) for zinc oxide deposition on amorphous silica powder.

Main Results:

  • The vapor pressure measurement setup allows for pre-selection of promising precursors and determination of suitable saturation temperatures.
  • The parallel reactor setup enables efficient screening of the ALD temperature window, significantly reducing process development time.
  • Successful demonstration of both setups using established ALD precursors and amorphous silica powder.

Conclusions:

  • The described setups offer a significant advancement in the development of ALD processes for powders.
  • These tools streamline precursor evaluation and temperature optimization, accelerating the adoption of ALD for powdered materials.
  • The methodology provides a faster and more efficient pathway for creating advanced functionalized powders via ALD.