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Jones pupil decomposition and its lithographic imaging impacts.

Zhiyuan Niu, Ming Ding, Junhai Jiang

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    |March 10, 2021
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    Summary

    This study systematically analyzes Jones pupil decomposition methods in optical lithography. Results show apodization and diattenuation significantly impact critical dimensions, while other components have negligible effects.

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    Area of Science:

    • Optical lithography
    • Semiconductor manufacturing
    • Lens imaging systems

    Background:

    • The Jones pupil describes projection lens imaging properties in optical lithography.
    • Previous studies explored Jones pupil decomposition, but lacked systematic analysis of methods and impacts.

    Purpose of the Study:

    • To systematically identify all Jones pupil decomposition methods.
    • To analyze and compare the lithographic imaging impacts of various Jones pupil components.

    Main Methods:

    • Proposed six novel decomposition methods for the Jones pupil.
    • Evaluated and compared the lithographic imaging impacts of each Jones component across all methods.

    Main Results:

    • Confirmed that different decomposition methods yield identical lithographic impacts.
    • Identified apodization (1.3 nm) and diattenuation (0.3 nm) as having dominant effects on critical dimension.
    • Determined that aberration, birefringence, rotator, and ellipticity components have negligible impacts.

    Conclusions:

    • Provides a comprehensive understanding of Jones pupil imaging impacts in optical lithography.
    • Highlights the critical roles of apodization and diattenuation in determining lithographic outcomes.
    • Establishes a systematic framework for analyzing Jones pupil effects, crucial for advanced semiconductor fabrication.