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Metallic Solids

Metallic Solids

Metallic solids such as crystals of copper, aluminum, and iron are formed by metal atoms. The structure of metallic crystals is often described as a uniform distribution of atomic nuclei within a “sea” of delocalized electrons. The atoms within such a metallic solid are held together by a unique force known as metallic bonding that gives rise to many useful and varied bulk properties.
All metallic solids exhibit high thermal and electrical conductivity, metallic luster, and malleability....

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Atomic-Layer-Deposition-Based 2D Transition Metal Chalcogenides: Synthesis, Modulation, and Applications.

Youngjun Kim¹, Whang Je Woo¹, Donghyun Kim¹

¹School of Electrical and Electronic Engineering, Yonsei University, 50 Yonsei-Ro, Seodaemun-Gu, Seoul, 03722, Republic of Korea.

Advanced Materials (Deerfield Beach, Fla.)

|March 22, 2021

Summary

Atomic layer deposition (ALD) enables industry-compatible synthesis and property modulation of 2D transition metal chalcogenides (TMCs). This research explores ALD-based TMCs for advanced nanoelectronics, sensors, and energy applications.

Keywords:

atomic layer deposition energy applications nanoelectronics transition metal chalcogenides

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Published on: December 29, 2016

Area of Science:

Materials Science
Nanotechnology
Surface Chemistry

Background:

Transition metal chalcogenides (TMCs) are versatile 2D materials with significant potential in electronics, sensors, and energy technologies.
Industry-compatible synthesis methods are crucial for the practical application of novel 2D materials.
Atomic layer deposition (ALD) is a key technique for thin-film deposition and material property tuning.

Purpose of the Study:

To describe the synthesis and modulation of 2D TMCs using atomic layer deposition (ALD).
To discuss the characteristics of ALD-synthesized TMCs for various applications.
To highlight ALD's role in improving thin film uniformity and creating low-dimensional nanomaterials on 2D TMCs.

Main Methods:

Synthesis of 2D TMCs via atomic layer deposition (ALD).
Modulation of 2D TMC properties, including carrier density and morphology, using ALD.
Characterization of ALD-based TMCs for performance evaluation.

Main Results:

ALD facilitates the controlled synthesis of uniform 2D TMC thin films without oxidation.
ALD enables precise modulation of TMC properties for tailored applications.
ALD is effective for growing low-dimensional nanomaterials on 2D TMC surfaces.

Conclusions:

ALD is a powerful, industry-compatible technique for synthesizing and functionalizing 2D TMCs.
ALD-based TMCs show promise for next-generation nanoelectronics, sensors, and energy devices.
Further research using ALD can unlock new possibilities for 2D TMC materials.