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Atomic Layer Deposition for Gradient Surface Modification and Controlled Hydrophilization of Ultrafiltration Polymer
Tamar Itzhak1, Naama Segev-Mark2, Assaf Simon1
1Department of Chemical Engineering, Technion-Israel Institute of Technology, Haifa 3200003, Israel.
ACS Applied Materials & Interfaces
|March 25, 2021
Summary
Atomic layer deposition (ALD) modifies polymeric membranes with aluminum oxide (Al2O3), controlling pore size and improving oil resistance. This surface engineering enhances membrane performance for various applications.
Area of Science:
- Materials Science
- Chemical Engineering
- Surface Chemistry
Background:
- Polymeric membranes are crucial in separation processes.
- Surface modification enhances membrane functionality.
- Atomic Layer Deposition (ALD) offers precise surface control.
Purpose of the Study:
- To investigate Al2O3 growth via ALD on polyacrylonitrile (PAN) and polyetherimide (PEI) membranes.
- To characterize the Al2O3 deposition gradient and its effect on membrane properties.
- To evaluate the oil antifouling performance of ALD-modified membranes.
Main Methods:
- Atomic Layer Deposition (ALD) of Al2O3.
- High-resolution transmission electron microscopy (HR-TEM).
- Elemental analysis.
- Confocal imaging for antifouling tests.
Main Results:
- Al2O3 deposition on PAN and PEI membranes achieved with minimal ALD cycles.
- ALD creates a controllable depth gradient of Al2O3, influencing pore size.
- Surface modification reduced oil droplet coverage, indicating improved antifouling properties.
Conclusions:
- ALD is an effective technique for modifying polymeric membranes with Al2O3.
- Control over deposition parameters allows tuning of membrane properties like pore size and hydrophilicity.
- Al2O3 surface modification enhances oil antifouling performance.
