Spatiotemporal patterns of gene expression around implanted silicon electrode arrays.
Cort H Thompson1, Akash Saxena1,2, Nicholas Heelan1,3,4
1Department of Biomedical Engineering, Michigan State University, East Lansing, MI 48824, United States of America.
Journal of Neural Engineering
|March 29, 2021
Summary
RNA sequencing reveals novel gene expression changes in brain tissue surrounding implanted microelectrode arrays, offering new insights into the foreign body response and neuroinflammation.
Area of Science:
- Neuroscience
- Biomaterials Science
- Molecular Biology
Background:
- Chronic tissue response to intracortical brain interfaces involves glial scarring, inflammation, and neuronal loss.
- The complete complexity of tissue reactions to implanted devices remains under investigation.
Purpose of the Study:
- To identify spatiotemporal gene expression patterns in brain tissue adjacent to implanted silicon microelectrode arrays.
- To characterize the foreign body response and uncover novel mechanisms impacting neuronal function at the device interface.
Main Methods:
- RNA sequencing was performed on interfacial (within 100 µm) and distal (500 µm) brain tissue from implanted silicon microelectrode arrays.
- Naïve, unimplanted brain tissue was used as a control group.
Main Results:
- Significant differential gene expression was observed between interfacial, distal, and naïve tissues.
- Previously known mechanisms (e.g., astroglial encapsulation) and novel pathways were identified.
- Perturbations in neuron-associated genes and genes related to oligodendrocyte, microglia, and astrocyte activity were detected.
Conclusions:
- This study enhances the understanding of complex brain tissue responses to implanted neurotechnologies.
- The findings provide a valuable gene expression toolkit for future research on bio-integration of neural implants.
