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Interfacial Interactions during Demolding in Nanoimprint Lithography.

Mingjie Li1, Yulong Chen1, Wenxin Luo1

  • 1Shenzhen Key Laboratory for Nanoimprint Technology, Department of Materials Science and Engineering, Southern University of Science and Technology, Shenzhen 518055, China.

Micromachines
|April 3, 2021
PubMed
Summary

Nanoimprint lithography (NIL) faces challenges in demolding due to interfacial forces. Solutions like new resists and surface modifications ease these forces, reducing defects for industrial applications.

Keywords:
demolding forcenanoimprintsurface modification

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Area of Science:

  • Materials Science and Engineering
  • Nanotechnology
  • Manufacturing Processes

Background:

  • Nanoimprint lithography (NIL) is a key technique for fabricating nano/micro-structured materials.
  • Demolding is a critical step in NIL, significantly impacting pattern transfer fidelity and process yield.
  • Existing NIL methods struggle with interfacial forces during demolding, limiting commercial viability.

Purpose of the Study:

  • To review the demolding processes in nanoimprint lithography.
  • To identify and analyze the origins of interfacial forces that cause demolding difficulties.
  • To present solutions for optimizing demolding and improving defect control in NIL.

Main Methods:

  • Review of existing nanoimprint lithography technologies (thermal and UV-NIL).
  • Analysis of process simulations for resist filling and demolding.
  • Detailed examination of interfacial forces (adhesion, friction) and their origins (CTE mismatch, volumetric shrinkage).
  • Exploration of solutions including new resist materials, mold surface modifications (e.g., ALD), and process condition tuning.

Main Results:

  • Interfacial forces, including adhesion and friction, are major limitations in NIL demolding.
  • Differences in thermal expansion coefficients and volumetric shrinkage contribute to high demolding forces.
  • Surface modifications and optimized process conditions effectively reduce interfacial forces.
  • Reduced demolding forces lead to lower defect rates in pattern transfer.

Conclusions:

  • Alleviating interfacial interactions is crucial for successful NIL demolding.
  • Implementing strategies like surface modification and process optimization enhances defect control.
  • These advancements are essential for meeting industrial manufacturing requirements and increasing NIL throughput.