One-Step Plasma Synthesis of Nitrogen-Doped Carbon Nanomesh

A one-step method for plasma synthesis of nitrogen-doped carbon nanomesh is presented. The method involves a molten polymer, which is a source of carbon, and inductively coupled nitrogen plasma, which is a source of highly reactive nitrogen species. The method enables the deposition of the nanocarbon layer at a rate of almost 0.1 µm/s. The deposited nanocarbon is in the form of randomly oriented multilayer graphene nanosheets or nanoflakes with a thickness of several nm and an area of the order of 1000 nm². The concentration of chemically bonded nitrogen on the surface of the film increases with deposition time and saturates at approximately 15 at.%. Initially, the oxygen concentration is up to approximately 10 at.% but decreases with treatment time and finally saturates at approximately 2 at.%. Nitrogen is bonded in various configurations, including graphitic, pyridinic, and pyrrolic nitrogen.