Related Experiment Video
Updated: Nov 10, 2025

Rendering SiO2/Si Surfaces Omniphobic by Carving Gas-Entrapping Microtextures Comprising Reentrant and Doubly Reentrant Cavities or Pillars
Published on: February 11, 2020
Quantification of Carbonic Contamination of Fused Silica Surfaces at Different Stages of Classical Optics
Robert Köhler1, Domenico Hellrung1, Daniel Tasche1,2
1Faculty of Engineering and Health, HAWK University of Applied Sciences and Arts, Von-Ossietzky-Str. 99/100, 37085 Göttingen, Germany.
Abstract:
The chemical composition of ground and polished fused silica glass surfaces plays a decisive role in different applications of optics. In particular, a high level of carbon impurities is often undesirable for further processing and especially for gluing or cementing where adhesion failure may be attributed to carbonic surface-adherent contaminants. In this study, the surface carbon content at different stages of classical optics manufacturing was thus investigated. Two different standard processes-grinding and lapping with two final polishing processes using both polyurethane and pitch pads-were considered. After each process step, the chemical composition and roughness of the surface were analysed using X-ray photoelectron spectroscopy and atomic force microscopy. An obvious correlation between surface roughness and effective surface area, respectively, and the proportion of carbon contamination was observed. The lowest carbon contamination was found in case of lapped and pitch polished surfaces.

