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Focus calibration method based on the illumination beam scanning angle modulation in a grating alignment system.

Tao Zhang, Yarui Ma, Jiean Li

    Optics Express
    |April 6, 2021
    PubMed
    Summary
    This summary is machine-generated.

    A novel focus calibration method precisely determines grating alignment system focus using beam scanning and interference imaging. This technique achieves sub-150nm uncertainty, enhancing lithography and precision machinery performance.

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    Area of Science:

    • Optics and Metrology
    • Precision Engineering

    Background:

    • Accurate focus determination is critical for high-precision alignment systems.
    • Existing methods may lack the required precision for advanced applications like lithography.

    Purpose of the Study:

    • To develop and validate a new focus calibration method for grating alignment systems.
    • To achieve standard uncertainty better than 150 nm in focus position determination.

    Main Methods:

    • Utilizing an illumination beam scanning module to create a circular beam path.
    • Generating an angular modulation interference image on a reference mark.
    • Employing a theoretical model to find the grating z-position where alignment offset is independent of beam tilt.

    Main Results:

    • The developed focus calibration method determines focus position with standard uncertainty below 150 nm.
    • The technique establishes a focus criterion based on the independence of alignment offset from incident beam tilt.

    Conclusions:

    • The proposed focus calibration method offers high precision for grating alignment systems.
    • This technique has the potential to significantly improve measurement performance in lithography and precision machine applications.