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Study on Material Removal Model by Reciprocating Magnetorheological Polishing.
Rensheng Wang1, Shichao Xiu2, Cong Sun2
1School of Mechanical Engineering, Liaoning Institute of Science and Technology, Benxi 117004, China.
Micromachines
|April 30, 2021
Summary
A new reciprocating magnetorheological polishing (RMRP) method enhances flat workpiece finishing. This study establishes material removal rate (MRR) models and optimizes parameters for improved surface roughness.
Area of Science:
- Materials Science and Engineering
- Manufacturing Processes
- Surface Metrology
Background:
- Precision optics require advanced finishing techniques.
- Magnetorheological (MR) fluids offer unique polishing properties.
- Existing methods may lack efficiency or control for specific applications.
Purpose of the Study:
- To introduce and validate a novel reciprocating magnetorheological polishing (RMRP) method for flat workpieces.
- To develop material removal rate (MRR) and polishing pressure models for RMRP.
- To investigate the influence of key process parameters on polishing performance.
Main Methods:
- Development of an RMRP setup based on established principles and the Preston equation.
- Mathematical modeling of MRR and normal polishing pressure.
- Experimental polishing of K9 optical flat glass using the RMRP setup.
- Systematic variation of workpiece rotation speed, eccentric wheel rotation speed, and eccentricity.
Main Results:
- The workpiece rotation speed significantly impacts MRR more than other parameters.
- MRR increased from 0.0115 ± 0.0012 to 0.0443 ± 0.0015 μm/min with higher workpiece rotation speed.
- Optimum parameters achieved a surface roughness reduction to Ra 50.8 ± 1.2 nm from Ra 330.3 ± 1.6 nm.
- Average relative errors between theoretical and experimental MRR values were below 17%.
Conclusions:
- The proposed RMRP method is effective for precision polishing of flat optical components.
- The developed MRR and pressure models provide a reliable basis for process optimization.
- Workpiece rotation speed is a critical parameter for controlling MRR in RMRP.

