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Related Experiment Video

Updated: Nov 7, 2025

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Analog Spatial Light Modulators Based on Micromirror Arrays.

Ulrike Dauderstädt1, Peter Dürr1, Andreas Gehner1

  • 1Fraunhofer IPMS, Maria-Reiche-Straße 2, 01109 Dresden, Germany.

Micromachines
|April 30, 2021
PubMed
Summary
This summary is machine-generated.

Fraunhofer IPMS offers advanced micromirror arrays with over 20 years of expertise. These devices now serve broader applications beyond microlithography, spanning visible and near-infrared light spectra.

Keywords:
image generationmicrolithographymicromirror arraysmicroscopywavefront shaping

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Area of Science:

  • Optoelectronics
  • Microsystems Engineering
  • Photonics

Background:

  • Fraunhofer Institute for Photonic Microsystems (IPMS) has over two decades of experience in micromirror array development.
  • Initial applications focused on microlithography, primarily utilizing deep ultraviolet light.

Purpose of the Study:

  • To provide a comprehensive overview of micromirror array devices.
  • To detail the design, fabrication, and characterization of these advanced photonic microsystems.

Main Methods:

  • Review of existing device designs and manufacturing processes.
  • Analysis of characterization data across different spectral ranges.

Main Results:

  • Demonstration of expanded application range for micromirror arrays.
  • Successful adaptation for visible and near-infrared light applications.

Conclusions:

  • Fraunhofer IPMS micromirror arrays are versatile and adaptable to various light spectra.
  • The technology has evolved significantly from its origins in microlithography.