Is Poly(methyl methacrylate) (PMMA) a Suitable Substrate for ALD?: A Review

Area of Science:

• Materials Science
• Surface Engineering
• Polymer Chemistry

Background:

• Poly (methyl methacrylate) (PMMA) is a versatile thermoplastic polymer known for transparency and strength.
• Surface engineering of PMMA via thin film coatings enhances its performance for applications like energy harvesting and water purification.
• Atomic Layer Deposition (ALD) offers precise surface modification but faces challenges with PMMA's limited active surface sites.

Purpose of the Study:

• To review research on employing PMMA as a substrate, support, or masking layer in various ALD techniques.
• To discuss the application of ALD-grown thin films on PMMA in flexible electronics, biomaterials, sensing, and photocatalysis.
• To provide a prospective outlook on the future role of ALD in PMMA processing.

Main Methods:

• Review of literature on thermal ALD, plasma-enhanced ALD, and area-selective ALD involving PMMA.
• Analysis of surface modification strategies for PMMA to facilitate ALD.
• Examination of characterization techniques used for ALD-modified PMMA.

Main Results:

• ALD can be successfully applied to PMMA by addressing its surface limitations, enabling tailored thin film growth.
• ALD on PMMA facilitates diverse applications, including enhanced flexible electronics, advanced biomaterials, sensitive sensors, and efficient photocatalysts.
• Various ALD techniques (thermal, plasma-enhanced, area-selective) are suitable for PMMA modification.

Conclusions:

• ALD is a powerful technique for surface engineering PMMA, expanding its application scope.
• Overcoming the inherent challenges of ALD on PMMA is crucial for realizing its full potential.
• Future research will likely focus on novel ALD processes and applications for modified PMMA.