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A method of using Si L-edge for O/Si and N/Si quantitative ratio analysis by electron energy loss spectroscopy (EELS)

Yun-Yu Wang1, Sook Fun Chan1, Qiang Jin1

  • 1Micron Technology Inc., 8000 S. Federal Way, Boise, ID, 83716, USA.

Micron (Oxford, England : 1993)
|May 3, 2021
PubMed

Keywords:
Electron energy loss spectroscopy (EELS)Quantitative elemental analysisTransmission electron microscopy (TEM)

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