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A UHV MOKE magnetometer complementing XMCD-PEEM at the Elettra Synchrotron
Francesca Genuzio1, Tomasz Giela1, Matteo Lucian2
1CERIC-ERIC, Basovizza, Trieste, Italy.
A new Magneto-Optical Kerr Effect (MOKE) magnetometer, compatible with ultra-high vacuum (UHV) and PhotoEmission Electron Microscopy (PEEM), offers sensitive magnetic measurements for surface and materials science research.
Area of Science:
- Surface Science
- Materials Science
- Magnetism
- Synchrotron Radiation
Background:
- Advanced characterization techniques are crucial for understanding magnetic properties of materials at the nanoscale.
- Integrating multiple surface analysis methods enhances comprehensive material investigation.
- Ultra-high vacuum (UHV) compatibility is essential for pristine surface studies.
Purpose of the Study:
- To develop and present a custom-built UHV-compatible Magneto-Optical Kerr Effect (MOKE) magnetometer.
- To enable in-situ magnetic measurements in conjunction with PhotoEmission Electron Microscopy (PEEM).
- To showcase the combined capabilities for advanced surface and materials science applications.
Main Methods:
- Construction of a UHV-compatible MOKE magnetometer with a liquid-nitrogen-cooled electromagnet (up to 140 mT).
- Implementation of longitudinal and polar MOKE geometries utilizing photoelastic modulator-based polarization analysis.
- Integration with a PEEM endstation at the Elettra synchrotron's Nanospectroscopy beamline, ensuring sample manipulation compatibility.
Main Results:
- Demonstrated monolayer sensitivity in magnetic measurements using cobalt ultra-thin films.
- Successful tandem operation with PEEM, allowing complementary X-ray imaging and spectroscopy.
- Verified performance of the custom-built UHV-MOKE magnetometer.
Conclusions:
- The developed UHV-MOKE magnetometer is a versatile tool for surface and materials science.
- Combining in situ growth, XMCD-PEEM, and MOKE magnetometry creates a powerful multitechnique facility.
- This integrated approach facilitates in-depth studies of magnetic phenomena in thin films and nanostructures.
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