Spatial Mesh-Based Surface Source Model for the Electron Contamination of an 18 MV Photon Beams

Source modeling is an approach to reduce computational burden in Monte Carlo simulations but at the cost of reduced accuracy. Although this method can be effective, one component of the source model that is exceptionally difficult to model is the electron contamination, a significant contributor to the skin and shallow dose.

To improve the accuracy for the electron contamination component of the overall source model, we have generated a spatial mesh based surface source model.

The source model is located downstream from the flattening filter and mirror but upstream from the movable jaws. A typical phase space file uses around ten parameters per particle, but this method simplifies this number to five components. By using only the electron distance from the central axis, angles from the central axis and energy, the computational time and disk space required is greatly reduced.

Despite the simplification in the source model, the electron contamination is still accurate to within 1.5%.