Design and fabrication of high-performance multimode interferometer in lithium niobate thin film

We propose and demonstrate a type of high-performance transverse magnetic (TM) multimode interferometer (MMI) in Z-cut thin film lithium niobate (TFLN). Both 1 × 2 and 4 × 4 MMI designs are demonstrated. Simulation results show that the insertion losses (ILs) are nominally about 0.157 and 0.297 dB for the 1 × 2 and 4 × 4 MMI, respectively, with wide fabrication tolerances. Based on the designed structure, the MMIs are fabricated using an argon based induced coupled plasma (ICP) etching method in Z-cut TFLN. The measured ILs are 0.268 and 0.63 dB for these two kinds of devices. The presented TM mode MMI featuring compact size and low loss can be used for both multifunctional devices and on-chip integrated circuits on a Z-cut TFLN platform.