Large-area optical metasurface fabrication using nanostencil lithography

We demonstrate a large-area fabrication process for optical metasurfaces utilizing reusable SiN on Si nanostencils. To improve the yield of the nanostencil fabrication, we partially etch the front-side SiN layer to transfer the metasurface pattern from the resist to the nanostencil membrane, preserving the integrity of the membrane during the subsequent potassium hydroxide etch. To enhance the reliability and resolution of metasurface fabrication using the nanostencil, we spin coat a sacrificial layer of resist to precisely determine the gap between the nanostencil and the metasurface substrate for the subsequent liftoff. 1.5 mm diameter PbTe meta-lenses on ${\rm{Ca}}{{\rm{F}}_2}$ fabricated using nanostencils show diffraction-limited focusing and focusing efficiencies of 42% for a 2 mm focal length lens and 53% for a 4 mm focal length lens. The nanostencils can also be cleaned using chemical cleaning methods for reuse.