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Updated: Nov 2, 2025

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Published on: August 26, 2010
Oxygen evolution reaction: a perspective on a decade of atomic scale simulations
Spyridon Divanis1, Tugce Kutlusoy1, Ida Marie Ingmer Boye1
1Center of Excellence (CoE), Department of Chemistry, University of Copenhagen Universitetsparken 5 2100 København Ø, Copenhagen Denmark Jan.Rossmeisl@chem.ku.dk.
Researchers analyzed DFT calculations for the oxygen evolution reaction (OER), finding the HO* and HOO* scaling relationship persists, hindering efficiency. New methods are proposed to address computational challenges in doped oxides for better OER catalysts.
Area of Science:
- Materials Science
- Computational Chemistry
- Electrochemistry
Background:
- The oxygen evolution reaction (OER) is crucial for water oxidation but suffers from intrinsic limitations, leading to inefficiency.
- Significant research efforts have focused on developing strategies to overcome these limitations and reduce the required overpotential.
- The universal scaling relationship between key intermediates (HO* and HOO*) is a known challenge in OER catalysis.
Purpose of the Study:
- To analyze published DFT calculation data for OER to understand the limited progress in reducing overpotential.
- To investigate the robustness of the HO*–HOO* scaling relationship across various computational methods and material structures.
- To identify computational challenges, particularly for doped semiconducting oxides, and propose solutions.
Main Methods:
- Systematic collection and analysis of published DFT calculation studies focused on the oxygen evolution reaction.
- Evaluation of binding energies for intermediates like HO* and HOO* to assess scaling relationships.
- Comparative analysis of trends in doped semiconducting oxides versus other oxide materials.
Main Results:
- The universal scaling relationship between HO* and HOO* intermediates was confirmed to be robust across diverse computational approaches.
- No clear trend was observed for the O* binding energy, indicating complex behavior.
- Doped semiconducting oxides exhibited distinct trends compared to other oxides, highlighting a computational description challenge.
Conclusions:
- The persistent HO*–HOO* scaling relationship remains a fundamental barrier to lowering OER overpotential.
- Accurately describing doped semiconducting oxides computationally presents a significant challenge.
- A novel computational approach is proposed to overcome these challenges for simulations of doped semiconductors.
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