Related Experiment Video
Updated: Nov 2, 2025
12:35
Atomically Traceable Nanostructure Fabrication
Published on: July 17, 2015
8.9K
Detecting nanoscale contamination in semiconductor fabrication using through-focus scanning optical microscopy.
Min-Ho Rim, Emil Agocs, Ronald Dixson1
1Microsystems and Nanotechnology Division, PML, NIST, Gaithersburg, MD 20899, USA.
Journal of Vacuum Science and Technology. B, Nanotechnology & Microelectronics : Materials, Processing, Measurement, & Phenomena : JVST B
|June 16, 2021
Summary
This study introduces a fast, light-based method, through-focus scanning optical microscopy (TSOM), to detect tiny nanoscale contaminants under 50 nm. Optimized optical simulations enhanced signal detection, enabling reliable identification of these critical industrial impurities.
Area of Science:
- Materials Science
- Optical Physics
- Nanotechnology
Background:
- Accurate detection of nanoscale contaminants is crucial for industrial quality control.
- Traditional methods for detecting sub-50 nm contaminants can be time-consuming or lack throughput.
- Optical microscopy offers potential for high-throughput, non-destructive analysis.
Purpose of the Study:
- To develop and validate a high-throughput, light-based method for detecting sub-50 nm nanoscale contaminants.
- To optimize measurement parameters for maximizing signal-to-noise ratio in through-focus scanning optical microscopy (TSOM).
- To compare the performance of TSOM against established high-resolution microscopy techniques.
Main Methods:
- Implementation of high-throughput, light-based through-focus scanning optical microscopy (TSOM).
- Utilized optical simulations for measurement parameter optimization to enhance contaminant signal detection.
- Employed atomic force microscopy (AFM) and scanning electron microscopy (SEM) as reference techniques for validation.
Main Results:
- Successfully detected industrially relevant nanoscale contaminants with heights below 50 nm using TSOM.
- Optimized optical parameters significantly improved the sensitivity and reliability of TSOM for contaminant detection.
- TSOM results showed strong correlation with reference methods (AFM and SEM), confirming its efficacy.
Conclusions:
- Through-focus scanning optical microscopy (TSOM) provides a viable high-throughput solution for detecting sub-50 nm nanoscale contaminants.
- Optical simulation-driven parameter optimization is effective for enhancing the performance of TSOM.
- TSOM offers a promising alternative for quality control applications requiring rapid and accurate nanoscale contamination analysis.
