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Local Random Pattern Flap Coverage for Implant Exposure following Open Reduction Internal Fixation via Extensile
Yingjie Liu1, Peihua Cai1, Liang Cheng2
1Department of Orthopedics, Shanghai Jiao Tong University Affiliated Sixth People's Hospital, 600 Yishan road, Shanghai, 200233, China.
Background:
Skin necrosis and implant exposure most often appear at the corner of Extensile Lateral Approach for open reduction and internal fixation (ORIF) for displaced intra-articular fracture of the calcaneus. Flap transfer is often used for coverage of this implant exposure. We introduced a new simple local random pattern flap to cover the implant exposure.
Methods:
From March 2017 to March 2020, 12 patients with implant exposure after ORIF for displaced intra-articular fracture of the calcaneus were treated with this procedure. The sizes of the defects ranged from 2 × 2 cm2 to 5 × 2 cm2. A local random pattern flap was designed according to the defect size. The lower edge of the flap was along with the wound upper edge and extended distally. The upper horizontal incision of the flap was made at the lateral malleolus level with a length of 5-7 cm depending on the wound defect. Then the random pattern flap was elevated and transferred to cover the defect area.
Results:
The mean follow-up duration was 6.3 months (ranging 4-13 months). All 12 flaps were uneventfully healed and all patients were able to wear shoes, and no debulking procedures were required.
Conclusion:
The local random pattern flap could be a choice for surgeons when implant exposure at the corner of Extensile Lateral Approach to the Calcaneus occurs.
