Exogenous silicon and hydrogen sulfide alleviates the simultaneously occurring drought stress and leaf rust infection...

Silicon (Si) and hydrogen sulfide (H₂S) are known to enhance plant defense against multiple stresses. Current study was conducted to investigate the application of Si and H₂S alone as well as in combination, improved physiological resilience of wheat plants to drought stress (DS) and pathogen-Puccinia triticina (Pt) infection. We aimed to increase the wheat plant growth and to enhance the DS tolerance and Pt resistance with the concurrent applications of H₂S and Si. In the first experiment, we selected the best growth enhancing concentration of H₂S (0.3 mM) and Si (6 mM) to further investigate their tolerance and resistance potential in the pot experiment under DS and pathogen infection conditions. The obtained results reveal that DS has further increased the susceptibility of wheat plants to leaf rust pathogen infection while, the sole application of Si and the simultaneous exogenous treatments of H₂S + Si enhanced the plant growth, decreased disease incidence, and significantly improved tolerance and defense mechanisms of wheat under individual and interactive stress conditions. The exogenous treatment of H₂S + Si improved the growth criteria, photosynthetic pigments, osmoprotectants, and defense related enzyme activities. The same treatment also reinforced the endogenous H₂S, Si, ABA and SA contents while decreased the disease incidence and oxidative stress indicators under individual and combined stress conditions. Overall, results from this study presents the influence of combined drought and P. triticina stress in wheat and reveal the beneficial impacts of concurrent exogenous treatment of H₂S + Si to mitigate the drought and pathogen (P. triticina) induced adverse effects.