Laser digital manufacturing of high-performance photodetectors based on a semiconductor microwire

Digital manufacturing technology meets the needs of today's technological development. However, the post-processing is essential for some digital fabrication methods, such as annealing and ultraviolet (UV) exposure. Femtosecond laser direct writing (FsLDW) has gained considerable attention, because it is a non-photolithographic, non-vacuum, and no heat fabrication method. The photodetectors based on a semiconductor microwire were fabricated via FsLDW. Finally, the responsivity of the fabricated photodetectors based on zinc oxide (ZnO), titanium dioxide (TiO₂), and tin oxide (SnO₂) can reach 14.27, 1.3, and 81 A/W, respectively. The enhanced performance is attributed to the rough and porous surface of ZnO, TiO₂, and SnO₂ microwires. The whole preparation process is realized by the programmed control femtosecond laser scanning path. This Letter demonstrates that the fabrication method has potential in the digital manufacturing of high-performance UV photodetectors.