Automated Adsorption Workflow for Semiconductor Surfaces and the Application to Zinc Telluride.

Oxana Andriuc1,2, Martin Siron2,3,4,5, Joseph H Montoya5

  • 1Department of Chemistry, University of California, Berkeley, California 94720, United States.

Summary

We developed an automated workflow using density functional theory to predict semiconductor surface adsorption for catalysis. This method efficiently generates adsorption data, accelerating the discovery of new materials for applications like CO2 reduction.

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