Automated Adsorption Workflow for Semiconductor Surfaces and the Application to Zinc Telluride.
Oxana Andriuc1,2, Martin Siron2,3,4,5, Joseph H Montoya5
1Department of Chemistry, University of California, Berkeley, California 94720, United States.
We developed an automated workflow using density functional theory to predict semiconductor surface adsorption for catalysis. This method efficiently generates adsorption data, accelerating the discovery of new materials for applications like CO2 reduction.
Area of Science:
- Materials Science
- Computational Chemistry
- Surface Science
Background:
- Surface adsorption is critical for heterogeneous catalysis efficiency.
- Predicting adsorption behavior is key to discovering new catalytic materials.
Purpose of the Study:
- To present an automated, high-throughput workflow for calculating semiconductor surface adsorption.
- To generate comprehensive adsorption descriptors for catalysis research.
Main Methods:
- Utilized density functional theory (DFT) calculations.
- Developed an automated workflow including surface search and adsorption structure construction.
- Computed energy, charge, geometric, and electronic descriptors.
Main Results:
- Generated high-throughput adsorption data for semiconductors.
- Successfully applied the workflow to zinc telluride for CO2 reduction photocatalysis.
- Created a database of computed descriptors.
Conclusions:
- The automated workflow accelerates the discovery of semiconductor materials for catalysis.
- This method provides a powerful tool for identifying efficient photocatalysts.
- The generated descriptors aid in understanding and predicting catalytic performance.
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