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Growth and Electrostatic/chemical Properties of Metal/LaAlO3/SrTiO3 Heterostructures
Published on: February 8, 2018
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Observation of Zero-Field Transverse Resistance in AlO_{x}/SrTiO_{3} Interface Devices
1Department of Physics, Northwestern University, Evanston, Illinois 60208, USA.
Physical Review Letters
|July 30, 2021
Summary
Domain walls in AlO_{x}/SrTiO_{3} (AlO_{x}/STO) interfaces create a unique transverse resistance in two-dimensional carrier gases. This resistance is sensitive to domain wall configuration, temperature, and crystal orientation.
Area of Science:
- Condensed Matter Physics
- Materials Science
- Surface Science
Background:
- Two-dimensional carrier gases (2DGCs) at oxide interfaces exhibit complex electronic properties.
- Domain walls in ferroelectric materials like SrTiO_{3} (STO) can significantly influence charge transport.
- Understanding interfacial phenomena is crucial for novel electronic device applications.
Purpose of the Study:
- To investigate the emergence of a finite transverse resistance in AlO_{x}/STO heterostructures at low temperatures.
- To explore the dependence of this transverse resistance on domain wall configuration, temperature, and crystallographic orientation.
- To elucidate the underlying physical mechanisms responsible for the observed transport anomalies.
Main Methods:
- Fabrication of AlO_{x}/SrTiO_{3} heterostructures in Hall bar geometry.
- Electrical transport measurements, including Hall effect measurements in zero magnetic field.
- Temperature-dependent measurements from low temperatures up to room temperature.
- Capacitance measurements to probe the dielectric properties of STO.
Main Results:
- A finite transverse resistance, dependent on domain wall configuration, was observed in AlO_{x}/STO devices below 70 K.
- The transverse resistance exhibited significant changes below 40 K, correlating with domain wall polarization.
- Heterostructures with (111) orientation showed substantially larger transverse resistance compared to (001) orientation.
- The observed phenomenon was attributed to inhomogeneous current flow along domain walls.
Conclusions:
- Domain walls in AlO_{x}/STO interfaces introduce a novel transport signature: a magnetic-field-free transverse resistance.
- The anisotropic behavior and temperature dependence suggest a strong interplay between domain wall physics and electronic transport.
- The findings highlight the importance of domain wall engineering and crystallographic orientation for controlling charge transport in oxide heterostructures.
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