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Predicting Pressure Sensitivity to Luminophore Content and Paint Thickness of Pressure-Sensitive Paint Using
Mitsugu Hasegawa1, Daiki Kurihara1, Yasuhiro Egami2
1Department of Aerospace and Mechanical Engineering, University of Notre Dame, Notre Dame, IN 46556, USA.
An artificial neural network model accurately predicted pressure sensitivity using limited experimental data. This approach enhances pressure-sensitive paint characterization for improved surface pressure measurements.
Area of Science:
- Materials Science
- Chemical Engineering
- Computational Modeling
Background:
- Pressure-sensitive paints (PSPs) are crucial for surface pressure measurements.
- Limited experimental data can hinder the development and optimization of PSPs.
- Predictive modeling can overcome data limitations in materials characterization.
Purpose of the Study:
- To develop and validate an artificial neural network (ANN) for predicting PSP pressure sensitivity.
- To investigate the influence of luminophore content and paint thickness on pressure sensitivity.
- To assess the effectiveness of data augmentation in improving ANN performance with limited datasets.
Main Methods:
- Construction and training of an artificial neural network (ANN).
- Utilizing experimental data including luminophore content and paint thickness.
- Application of a data augmentation technique to expand the dataset.
- Evaluation of ANN prediction accuracy using mean absolute percentage error.
Main Results:
- The ANN successfully predicted pressure sensitivity based on luminophore content and paint thickness.
- Predictions were within confidence intervals reflecting experimental errors.
- Data augmentation effectively increased the number of data points for training.
- The model demonstrated good predictive accuracy for PSP characteristics.
Conclusions:
- ANNs combined with data augmentation offer a powerful approach for characterizing PSPs.
- This methodology can improve the performance of PSPs for global surface pressure measurements.
- The study highlights the potential of computational methods to accelerate materials development.
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