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First-principles study of bipolar resistive memories based on monolayerα-GeTe
Yuehua Dai1, Bin Yang1, Xing Li1
1School of Electronics and Information Engineering, Anhui University, Hefei 230000, People's Republic of China.
Nanotechnology
|August 12, 2021
Summary
This study explores graphene/monolayer alpha-germanium telluride structures for resistive random-access memory (RRAM). The research reveals promising bipolar resistance characteristics and high performance, driven by tellurium vacancies.
Area of Science:
- Materials Science
- Condensed Matter Physics
- Computational Materials Science
Background:
- Monolayer materials offer unique electronic properties.
- Resistive random-access memory (RRAM) requires novel materials for improved performance.
- Germanium telluride (GeTe) is a promising material for electronic devices.
Purpose of the Study:
- Investigate the electrical properties of monolayer alpha-germanium telluride (ML α-GeTe).
- Explore the potential of graphene/ML α-GeTe heterostructures for RRAM applications.
- Understand the mechanism behind the observed electrical characteristics and optimize device performance.
Main Methods:
- First-principles calculations to study electrical properties of ML α-GeTe.
- Analysis of potential distribution and band structure to explain anisotropy and nonlinearity.
- Construction and stability calculation of graphene/ML α-GeTe interfaces using binding energy and Mulliken population.
- Fabrication of graphene/ML α-GeTe/graphene devices and calculation of current-voltage (IV) characteristics.
Main Results:
- Armchair α-GeTe exhibits ohmic behavior, while zigzag α-GeTe shows nonlinear current.
- Relatively stable interfaces (GC3 and TC3) were identified for graphene and ML α-GeTe.
- The GR/ML α-GeTe/GR device demonstrates bipolar resistance characteristics with suitable set/reset voltages and a high window value (10^4).
- Resistance mechanism is attributed to the drift of Te vacancies forming conductive filaments, with performance enhanced by Te vacancy creation.
Conclusions:
- Graphene/ML α-GeTe/graphene heterostructures show potential for high-performance RRAM.
- The study provides insights into the electrical properties and resistance mechanisms of ML α-GeTe based devices.
- The findings are valuable for the design and application of novel RRAM devices.

