First-principles study of bipolar resistive memories based on monolayerα-GeTe

Yuehua Dai1, Bin Yang1, Xing Li1

  • 1School of Electronics and Information Engineering, Anhui University, Hefei 230000, People's Republic of China.

Nanotechnology
|August 12, 2021
PubMed
Summary

This study explores graphene/monolayer alpha-germanium telluride structures for resistive random-access memory (RRAM). The research reveals promising bipolar resistance characteristics and high performance, driven by tellurium vacancies.