Molecular basis and regulatory mechanisms underlying fungal insecticides' resistance to solar ultraviolet irradiation

Resistance to solar ultraviolet (UV) irradiation is crucial for field-persistent control efficacies of fungal formulations against arthropod pests, because their active ingredients are formulated conidia very sensitive to solar UV wavelengths. This review seeks to summarize advances in studies aiming to quantify, understand and improve conidial UV resistance. One focus of studies has been on the many sets of genes that have been revealed in the postgenomic era to contribute to or mediate UV resistance in the insect pathogens serving as main sources of fungal insecticides. Such genetic studies have unveiled the broad basis of UV-resistant molecules including cytosolic solutes, cell wall components, various antioxidant enzymes, and numerous effectors and signaling proteins, that function in developmental, biosynthetic and stress-responsive pathways. Another focus has been on the molecular basis and regulatory mechanisms underlying photorepair of UV-induced DNA lesions and photoreactivation of UV-impaired conidia. Studies have shed light upon a photoprotective mechanism depending on not only one or two photorepair-required photolyases, but also two white collar proteins and other partners that play similar or more important roles in photorepair via interactions with photolyases. Research hotspots are suggested to explore a regulatory network of fungal photoprotection and to improve the development and application strategies of UV-resistant fungal insecticides. © 2021 Society of Chemical Industry.