Related Experiment Video
Updated: Jul 19, 2026

Monolayer Contact Doping of Silicon Surfaces and Nanowires Using Organophosphorus Compounds
Published on: December 2, 2013
Microstructure Evaluation and Impurities in La Containing Silicon Oxynitrides
Abbas Saeed Hakeem1, Sharafat Ali2, Thomas Höche3,4
1Interdisciplinary Research Center for Hydrogen & Energy Storage (IRC-HES) Research Institute, King Fahd University of Petroleum & Minerals, Dhahran 31261, Saudi Arabia.
Abstract:
Oxynitride glasses are not yet commercialised primarily due to the impurities present in the network of these glasses. In this work, we investigated the microstructure and instinctive defects in nitrogen rich La-Si-O-N glasses. Glasses were prepared by heating a powder mixture of pure La metal, Si3N4, and SiO2 in a nitrogen atmosphere at 1650-1800 °C. The microstructure and impurities in the glasses were examined by optical microscopy, scanning electron microscopy, atomic force microscopy, and transmission electron microscopy in conjunction with electron energy-loss spectroscopy. Analyses showed that the glasses contain a small amount of spherical metal silicide particles, mostly amorphous or poorly crystalline, and having sizes typically ranging from 1 µm and less. The amount of silicide was estimated to be less than 2 vol. %. There was no systematic relation between silicide formation and glass composition or preparation temperature. The microstructure examination revealed that the opacity of these nitrogen rich glasses is due to the elemental Si arise from the decomposition reaction of silicon nitride and silicon oxide, at a high temperature above ~1600 °C and from the metallic silicide particles formed by the reduction of silicon oxide and silicon nitride at an early stage of reaction to form a silicide intermetallic with the La metal.
Related Concept Videos
Imperfections in Crystal Structure: Stoichiometric Point Defects
Imperfections in Crystal Structure: Non-Stoichiometric Defects

