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Updated: Oct 22, 2025

A Fabrication and Measurement Method for a Flexible Ferroelectric Element Based on Van Der Waals Heteroepitaxy
Published on: April 8, 2018
Low-Power OR Logic Ferroelectric In-Situ Transistor Based on a CuInP2S6/MoS2 Van Der Waals Heterojunction
Kun Yang1, Shulong Wang1, Tao Han1
1Key Laboratory for Wide-Band Gap Semiconductor Materials and Devices of Education, The School of Microelectronics, Xidian University, Xi'an 710071, China.
Abstract:
Due to the limitations of thermodynamics, the Boltzmann distribution of electrons hinders the further reduction of the power consumption of field-effect transistors. However, with the emergence of ferroelectric materials, this problem is expected to be solved. Herein, we demonstrate an OR logic ferroelectric in-situ transistor based on a CIPS/MoS2 Van der Waals heterojunction. Utilizing the electric field amplification of ferroelectric materials, the CIPS/MoS2 vdW ferroelectric transistor offers an average subthreshold swing (SS) of 52 mV/dec over three orders of magnitude, and a minimum SS of 40 mV/dec, which breaks the Boltzmann limit at room temperature. The dual-gated ferroelectric in-situ transistor exhibits excellent OR logic operation with a supply voltage of less than 1 V. The results indicate that the CIPS/MoS2 vdW ferroelectric transistor has great potential in ultra-low-power applications due to its in-situ construction, steep-slope subthreshold swing and low supply voltage.
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