Related Experiment Video
Updated: Oct 21, 2025

In Situ Transmission Electron Microscopy with Biasing and Fabrication of Asymmetric Crossbars Based on Mixed-Phased a-VOx
Published on: May 13, 2020
WO3/BiVO4 Photoanodes: Facets Matching at the Heterojunction and BiVO4 Layer Thickness Effects
Ivan Grigioni1, Giovanni Di Liberto2, Maria Vittoria Dozzi1
1Dipartimento di Chimica, Università degli Studi di Milano, Via Golgi 19, 20133 Milano, Italy.
Abstract:
Photoelectrochemical solar energy conversion offers a way to directly store light into energy-rich chemicals. Photoanodes based on the WO3/BiVO4 heterojunction are most effective mainly thanks to the efficient separation of photogenerated charges. The WO3/BiVO4 interfacial space region in the heterojunction is investigated here with the increasing thickness of the BiVO4 layer over a WO3 scaffold. On the basis of X-ray diffraction analysis results, density functional theory simulations show a BiVO4 growth over the WO3 layer along the BiVO4 {010} face, driven by the formation of a stable interface with new covalent bonds, with a favorable band alignment and band bending between the two oxides. This crystal facet phase matching allows a smooth transition between the electronic states of the two oxides and may be a key factor ensuring the high efficiency attained with this heterojunction. The photoelectrochemical activity of the WO3/BiVO4 photoanodes depends on both the irradiation wavelength and the thickness of the visible-light-absorbing BiVO4 layer, a 75 nm thick BiVO4 layer on WO3 being best performing.
More Related Videos
04:57Residue-Free Fabrication of van der Waals Heterostructures of Two-Dimensional Materials
Published on: July 18, 2025
08:50Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017
Related Concept Videos
Photoelectric Effect
Biasing of Metal-Semiconductor Junctions
In Schottky junctions, where the semiconductor is n-type, applying a positive voltage to the metal relative to the semiconductor reduces its Fermi...
Biasing of P-N Junction
In equilibrium, no external voltage is applied across the p-n junction. The depletion region is formed at the junction interface due to the diffusion of carriers, which leaves behind charged dopants, acceptors on the p-side, and donors on the n-side. These immobile charges create an electric field that prevents further diffusion of carriers. The related energy band...
P-N junction
Metal-Semiconductor Junctions
Schottky Barriers
Schottky barriers arise when a metal with a work function (Φm) contacts a semiconductor with a different work function (Φs). Initially, electrons transfer until the Fermi levels of the metal and semiconductor align at equilibrium. For instance, if Φm > Φs, the semiconductor Fermi level is higher than the metal's before contact. The...
Photoluminescence: Applications