Related Experiment Video
Updated: Oct 19, 2025

A Facile Synthetic Method to Obtain Bismuth Oxyiodide Microspheres Highly Functional for the Photocatalytic Processes of Water Depuration
Published on: March 29, 2019
Roles of Mo dopant in Bi2WO6 for enhancing photocatalytic activities
Pimchanok Longchin1,2, Sumet Sakulsermsuk1,3,4, Khatcharin Wetchakun5
1Department of Physics and Materials Science, Faculty of Science, Chiang Mai University, Chiang Mai 50200, Thailand. natda.we@cmu.ac.th.
Abstract:
We present the investigation of the roles of molybdenum (Mo) dopant with a concentration of 0.0625% to 1.0% Mo into bismuth tungstate (Bi2WO6) by a one-step hydrothermal method for the enhancement of photocatalytic activities. The obtained materials and doping effects were characterized by the morphology, crystal structure, chemical states, and optical properties. By combining XRD, XANES, and EXAFS studies, the distortion of the local structure with substitutional doping was revealed as doping with Mo ions was located at the lattice sites of the tungsten ions. Photocatalytic reactions of Mo-doped Bi2WO6 were studied by the degradation of methyl orange dye under visible light irradiation. The results show that the optimal concentration of Mo dopant is 0.25%, with the highest photocatalytic activity up to ∼2-fold compared to the bare Bi2WO6. From our investigation, we propose that the impurity level is located below the conduction band edge of Bi2WO6 after doping with Mo6+ ions. This impurity level acts as an electron trapping site to prevent the transition of excited electrons from the conduction band to the valence band. By trapping experiments, the superoxide anion radicals (O2˙-) as the main active species to enhance photocatalytic efficiency was established.
More Related Videos
05:47Preparation of Polyoxometalate-based Photo-responsive Membranes for the Photo-activation of Manganese Oxide Catalysts
Published on: August 7, 2018
08:50Preparation of Large-area Vertical 2D Crystal Hetero-structures Through the Sulfurization of Transition Metal Films for Device Fabrication
Published on: November 28, 2017