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Studies of Ion Kinetic-Energy Distributions in the Gaseous Electronics Conference RF Reference Cell.

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Production Rates for Oxyfluorides SOF2, SO2F2, and SOF4 in SF6 Corona Discharges.

R J Van Brunt1

  • 1National Bureau of Standards, Gaithersburg, MD 20899.

Journal of Research of the National Bureau of Standards (1977)
|September 27, 2021
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Summary

Corona discharges in sulfur hexafluoride (SF6) with oxygen and water produce abundant oxyfluorides. Their production rate is primarily limited by SF6 dissociation, not trace gas levels.

Keywords:
SF6SF6/O2 mixturesSO2F2SOF2SOF4corona dischargesdecomposition ratesproduction ratessulfurhexafluoridesulfurylfluoridethionyl tetrafluoridethionylfluoride

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Area of Science:

  • Electrical Engineering
  • Chemical Physics
  • Materials Science

Background:

  • Sulfur hexafluoride (SF6) is widely used in high-voltage equipment.
  • Corona discharges in SF6 can produce hazardous byproducts.
  • Understanding byproduct formation is crucial for equipment safety and longevity.

Purpose of the Study:

  • Quantify the production rates of oxyfluorides (SOF2, SO2F2, SOF4) and other species (SO2, OCS, CO2) from SF6 corona discharges.
  • Investigate the influence of gas pressure, discharge parameters, and trace contaminants (O2, H2O) on byproduct formation.
  • Determine the primary factors controlling SF6 decomposition in electrical discharges.

Main Methods:

  • Experimental measurement of absolute energy and charge rates-of-production for gaseous species.
  • Controlled corona discharge experiments in SF6 with varying O2 and H2O concentrations.
  • Gas analysis using chemical procedures to identify and quantify products.

Main Results:

  • SOF2, SO2F2, and SOF4 are the dominant, long-lived gaseous byproducts.
  • Oxyfluoride production is independent of O2 and H2O concentrations below ~1%.
  • The dissociation rate of SF6 is the rate-limiting factor for oxyfluoride production.

Conclusions:

  • SF6 decomposition in corona discharges is primarily governed by the SF6 dissociation rate.
  • Trace gas levels of O2 and H2O do not significantly control oxyfluoride formation at low concentrations.
  • Results inform the design of chemical diagnostics for SF6-insulated high-voltage apparatus.