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Related Experiment Video

Updated: Oct 19, 2025

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

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Published on: June 12, 2018

Thermal scanning probe lithography-a review.

Samuel Tobias Howell¹, Anya Grushina², Felix Holzner²

¹Microsystems Laboratory, École Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland.

Microsystems & Nanoengineering

|September 27, 2021

Summary

This summary is machine-generated.

Thermal scanning probe lithography (t-SPL) offers precise nanoscale patterning through localized heating. This review explores t-SPL

Keywords:

Chemistry Nanoscale devices Nanoscale materials Optical materials and structures

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Area of Science:

Nanotechnology
Materials Science
Surface Science

Background:

Thermal scanning probe lithography (t-SPL) is an emerging direct-write nanolithography technique.
It utilizes a heated tip for ultrafast, localized thermal surface processing.

Purpose of the Study:

To review the fundamental aspects and state-of-the-art results of t-SPL.
To explore t-SPL for material removal, conversion, and addition.
To provide a knowledge base of t-SPL capabilities and limitations for nanoengineers.

Main Methods:

Review of existing literature and experimental results on t-SPL.
Analysis of process parameters and application examples for different material interactions.
Investigation of opportunities and challenges in t-SPL applications.

Main Results:

t-SPL enables high-resolution patterning through localized thermal effects.
Three primary modes of material interaction (removal, conversion, addition) are detailed.
Specific process parameters and applications are presented for each interaction type.

Conclusions:

t-SPL is a versatile technique for nanofabrication and material science.
Understanding its capabilities and limitations guides optimal application.
Further exploration of t-SPL's potential, especially with ultrahigh heating/cooling rates, is warranted.