Photovoltaic distribution on an amorphous-silicon solar cell in near-band-edge excitation observed by...

We describe the development of a conductive-probe atomic force microscopy method combined with a fine-wavelength-tunable light source and use it to observe the photovoltaic distribution on a cross-sectional surface of an amorphous-silicon solar cell in near-band-edge excitation. The light source's wavelength resolution is dλ = 1 nm, and its intensity is 1 µW/cm² (10 mW/m²); this excitation condition is sufficiently fine and weak to investigate electrical properties in the near-band-edge wavelength range. The photovoltage is observed in the indium tin oxide (ITO) region, and the maximum photovoltage increases when we increase the excitation energy of the illumination light. However, the photovoltaic distribution parallel to the ITO layer becomes relatively localized as the excitation energy increases. This localized photovoltaic distribution suggests that the conductivity of the electric current path within the ITO layer should be inhomogeneous.