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Related Experiment Video

Updated: Oct 17, 2025

Three-Dimensional Shape Modeling and Analysis of Brain Structures
05:33

Three-Dimensional Shape Modeling and Analysis of Brain Structures

Published on: November 14, 2019

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End-to-end pattern optimization technology for 3D shape measurement.

Hengyu Wang, Bin Lin, Peng Zhou

    Applied Optics
    |October 6, 2021
    PubMed
    Summary
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    This study introduces a new pattern optimization technique to improve 3D measurement accuracy in phase-measuring profilometry systems. The method effectively minimizes nonlinear errors from the gamma effect, enhancing measurement quality.

    Area of Science:

    • Optics and Photonics
    • Metrology
    • Computer Vision

    Background:

    • Nonlinear errors from the gamma effect degrade measurement accuracy in phase-measuring profilometry.
    • Accurate 3D reconstruction is crucial for various scientific and industrial applications.

    Purpose of the Study:

    • To develop a robust, end-to-end pattern optimization technology for phase-height mapping.
    • To mitigate phase errors caused by nonlinear gamma effects in profilometry systems.

    Main Methods:

    • Optimizing projection images to generate sinusoidal patterns directly on the camera image, bypassing projector-camera phase conversion.
    • Utilizing chessboard calibration for pixel set mapping.
    • Employing multiscale and dislocation optimization methods with proportional integral derivative (PID) control for projection image optimization.

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    Last Updated: Oct 17, 2025

    Three-Dimensional Shape Modeling and Analysis of Brain Structures
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    Three-Dimensional Shape Modeling and Analysis of Brain Structures

    Published on: November 14, 2019

    7.3K
    Precision Measurements and Parametric Models of Vertebral Endplates
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    Main Results:

    • Successfully generated standard sinusoidal patterns on the reference plane within the camera image.
    • Effectively avoided phase errors associated with projector-camera phase conversion.
    • Demonstrated high-quality three-dimensional measurement by mitigating nonlinear gamma effect influences.

    Conclusions:

    • The proposed pattern optimization technology offers a robust solution for accurate 3D measurements.
    • This method significantly enhances the reliability of phase-measuring profilometry systems by addressing nonlinear errors.