Chromatic aberration in planar focusing mirrors based on a monolithic high contrast grating

We present an experimental and theoretical analysis of chromatic aberration in a monolithic metasurface focusing mirror. The planar focusing mirror is based on a monolithic high contrast grating made from GaAs, designed for a wavelength of 980 nm. Light is focused on the high refractive index side of the mirror. Our measurements, performed between 890 and 1050 nm, indicate a shift of the focal point position that is inversely proportional to the wavelength. The experimental results are in very good agreement with our simulations, in terms of both the position of the focal point and the spectral dependence. Based on our numerical simulations, we show that simply modifying the grating height does not lead to significant alteration of the focal length or to any noticeable reduction in chromatic aberration. Using numerical simulations, we analyze how the height of the stripes, the refractive index of the grating material, and its dispersion combine to influence the chromatic aberration of the mirror.