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Related Concept Videos

Atomic Absorption Spectroscopy: Lab01:21

Atomic Absorption Spectroscopy: Lab

658
For AAS measurements, samples must be introduced as clear solutions, often requiring extensive preliminary treatment to dissolve materials like soils, animal tissues, and minerals. Common methods for sample preparation include treatment with hot mineral acids, wet ashing, combustion in closed containers, high-temperature ashing, or fusion with reagents.
 Solutions containing organic solvents, such as low-molecular-mass alcohols, esters, or ketones, enhance absorbances by increasing...
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Attenuated Total Reflectance (ATR) Infrared Spectroscopy: Overview01:13

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Attenuated total reflectance (ATR) infrared spectroscopy is a powerful analytical technique used to study the composition of materials. It is widely employed in chemistry, materials science, forensic science, and other fields where sample characterization is required. ATR has several advantages over traditional transmission IR spectroscopy, including the requirement of little to no sample preparation and the ability to analyze a wide range of samples.
The ATR process begins by directing a beam...
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Atomic Absorption Spectroscopy: Instrumentation01:22

Atomic Absorption Spectroscopy: Instrumentation

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An atomic absorption spectrophotometer (AAS) comprises several components: a radiation source, an atomizer, a monochromator, and a detector. The radiation source can be a hollow-cathode lamp (HCL) or an electrodeless-discharge lamp (EDL), both of which provide a narrow emission line of the required wavelength. However, some instruments use continuum sources and high-resolution monochromators to achieve a narrow range of radiation.
The atomizer used in AAS can be either a flame atomizer or an...
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Atomic Absorption Spectroscopy: Atomization Methods01:25

Atomic Absorption Spectroscopy: Atomization Methods

729
Atomic Absorption Spectroscopy (AAS) atomizes samples through flame atomization or electrothermal atomization. Flame atomization typically involves a nebulizer and spray chamber assembly to combine the sample with a fuel–oxidant mixture, creating a fine aerosol mist that enters a burner. Typically, the fuel and oxidant are combined in an approximately stoichiometric ratio. However, for atoms that are easily oxidized, a fuel-rich mixture may be more advantageous. Only about 5% of the...
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Atomic Emission Spectroscopy: Lab01:29

Atomic Emission Spectroscopy: Lab

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AES is a powerful analytical technique, especially effective when used with plasma sources, producing abundant spectra in characteristic emission lines. The Inductively Coupled Plasma (ICP), in particular, yields superior quantitative analytical data due to its high stability, low noise, low background, and minimal interferences under optimal experimental conditions. However, newer air-operated microwave sources are emerging as promising alternatives that could be more cost-effective than...
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Atomic Absorption Spectroscopy: Overview01:27

Atomic Absorption Spectroscopy: Overview

2.6K
Atomic absorption spectroscopy (AAS) is a technique used to analyze elements by measuring electromagnetic radiation (EMR) absorbed by atoms, which causes them to transition to a higher-energy orbit. The most crucial step in AAS is atomization, where the analyte is converted into gas-phase atoms, typically through a flame or furnace. Some of these atoms become thermally excited in the flame, while most remain in the ground state.
When irradiated by EMR of a particular wavelength, these...
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Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films
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A practical method for determining film thickness using X-ray absorption spectroscopy in total electron yield mode.

Noritake Isomura1, Keiichiro Oh-Ishi1, Naoko Takahashi1

  • 1Toyota Central R&D Laboratories Inc., 41-1 Yokomichi, Nagakute, Aichi 480-1192, Japan.

Journal of Synchrotron Radiation
|November 5, 2021
PubMed
Summary

A new X-ray absorption spectroscopy method accurately determines thin film thickness using a modified logarithmic equation. This technique offers a reliable way to analyze various materials with thin films.

Keywords:
X-ray absorption fine structure (XAFS)copper oxidefilm thicknesssilicon dioxide

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Area of Science:

  • Materials Science
  • Surface Science
  • Spectroscopy

Background:

  • Thin films significantly influence material and device properties.
  • Accurate characterization of thin film thickness is crucial for understanding these influences.

Purpose of the Study:

  • To propose a novel method for determining thin film thickness using X-ray absorption spectroscopy (XAS).
  • To adapt and validate a modified logarithmic equation for XAS-based film thickness analysis.

Main Methods:

  • Utilized spectral separation and a modified logarithmic equation derived from electron spectroscopy principles.
  • Investigated the longer decay length in XAS due to inelastic electron scattering.
  • Experimentally determined a modification factor using oxidized Si and Cu thin films (19 nm and 39 nm).

Main Results:

  • The proposed XAS method successfully derived thin film thicknesses.
  • Experimental validation confirmed the accuracy of the modified logarithmic equation.
  • The modification factor was determined for specific material systems.

Conclusions:

  • The developed XAS method provides a viable approach for thin film thickness measurement.
  • This technique is applicable to the analysis of diverse materials featuring thin films.
  • The findings contribute to advanced characterization techniques in materials science.