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A practical method for determining film thickness using X-ray absorption spectroscopy in total electron yield mode

Noritake Isomura1, Keiichiro Oh-Ishi1, Naoko Takahashi1

  • 1Toyota Central R&D Laboratories Inc., 41-1 Yokomichi, Nagakute, Aichi 480-1192, Japan.

Journal of Synchrotron Radiation
|November 5, 2021
PubMed

Keywords:
X-ray absorption fine structure (XAFS)copper oxidefilm thicknesssilicon dioxide

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