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Updated: Oct 13, 2025

U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Published on: February 21, 2019

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Correction: Mixed H2O/H2 plasma-induced redox reactions of thin uranium oxide films under UHV conditions

Ghada El Jamal1, Thomas Gouder2, Rachel Eloirdi2

  • 1School of Engineering Sciences in Chemistry, Biotechnology and Health (CBH), Department of Chemistry, Applied Physical Chemistry, KTH Royal Institute of Technology, SE-100 44 Stockholm, Sweden. matsj@kth.se.

Dalton Transactions (Cambridge, England : 2003)
|November 12, 2021
PubMed

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