Step-Edge Epitaxy for Borophene Growth on Insulators

Borophene─a monatomic layer of boron atoms─stands out among two-dimensional (2D) materials, with its versatile properties tantalizing for physics exploration and next-generation devices. Yet its phases are all synthesized on and stay bound to metal substrates, hampering both characterization and use. Borophene growth on an inert insulator would allow postsynthesis exfoliation, but the weak adhesion to such a substrate results in a high 2D nucleation barrier, preventing clean borophene growth. This challenge can be circumvented in a strategy devised and demonstrated here with ab initio calculations. Naturally present 1D-defects, the step-edges on an h-BN substrate surface, enable boron epitaxial assembly, reduce the nucleation dimensionality, and lower the barrier by an order of magnitude (to 1.1 eV or less), yielding a v_1/9 phase. Weak borophene adhesion to the insulator makes it readily accessible for comprehensive property tests or transfer into the device setting.