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Updated: Oct 12, 2025

Picometer-Precision Atomic Position Tracking through Electron Microscopy

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Sub-pixel position estimation algorithm based on Gaussian fitting and sampling theorem interpolation for wafer

Songyong Pan, Shaoqing Wang, Jinghao Xu

|November 22, 2021

Summary

This summary is machine-generated.

This study introduces a faster, sub-pixel wafer alignment algorithm using Gaussian fitting and interpolation. It achieves high accuracy comparable to existing methods while significantly improving calculation speed for lithographic tools.

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Last Updated: Oct 12, 2025

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Area of Science:

Semiconductor manufacturing
Optical metrology
Image processing

Background:

Wafer alignment is crucial for lithographic tool accuracy and throughput.
Current self-correlation methods offer high accuracy but are slow and computationally intensive.
Faster, accurate alignment algorithms are needed to improve semiconductor fabrication efficiency.

Purpose of the Study:

To develop a novel sub-pixel position estimation algorithm for wafer alignment.
To enhance the speed and maintain the accuracy of alignment processes in lithography.
To provide a viable alternative to the computationally expensive self-correlation method.

Main Methods:

A new algorithm combining Gaussian fitting and sampling theorem interpolation is proposed.
The algorithm reconstructs alignment signals using interpolation before Gaussian fitting.
Performance is validated using simulated and experimentally captured alignment marks.

Main Results:

The proposed algorithm achieves a repeat accuracy of 1/100 pixels, matching the self-correlation method.
Calculation speed is significantly improved, requiring only about one-third of the time of the self-correlation method.
The algorithm demonstrates robustness and high accuracy in tests.

Conclusions:

The Gaussian fitting and sampling theorem interpolation algorithm offers a faster and accurate solution for wafer alignment.
This method addresses the speed limitations of traditional self-correlation techniques.
The developed algorithm can enhance throughput and maintain precision in advanced lithographic processes.